RESITOP for Photoresist
We succeeded to launch novolak resin for semiconductor photoresist in 1980, this development was first in Japan.
We are still improving our development and production technology for materials for photoresist which applied from g-line to forefront technology.
Photoresist is the material which utilized in production of semiconductor, and display materials such as LCD TV, monitor, and smart phone.
Our materials are mapped to key materials for photoresist.
Features
- Designated with perfect control of Molecular Weight, ADR (Alkali Dissolution Rate) and PD (polymer Dispersion)
- Stable production which based on production process and analysis facility
- Metal ion control by ppb basis
- Customize design for materials for novolak, PHS, acrylate polymer
Designated with perfect control of molecular weight,ADR(alkali dissolution) and PD(polymer Dispertion)
By modification and design of monomer composition, we can control MW and ADR perfectly, we are also available to modify MW and ADR with same composition by our special synthesis condition
We are able to produce resin by fraction,which frequently utilized in PD control.
By utilizing synthesis method like fraction,We are able to modify PD of resin.
Our control is capable up to PD 2.0 in novolak.
Stable production based on production process and analysis facility
It is difficult to detect affection of lot variance in specifications of novolaks for electronic materials by using normal NMR and GPC.
Based on this difficulty, we have established unique analysis and inspection method for resin. By feedback these analysis result to production process, our advanced production technology is able to realize stable resin quality.
Metal ion control by ppb basis
From perfect control of raw materials to verification of resin contact materials of production facility, we have good command of control of contamination, metal ion removing technology.
Our target is standardization of metal ion (such as Na, Fe, Cr, Ni) contents level within several hundreds to few ppb.
We are also challenging to control 24 elements of metal which is required in semiconductors industry.
Customize design of various materials such as Novolak, PHS, Acrylate polymers
We will positively consider to engage OEM, to make full use of our production technology.
Purpose
- Photoresist for Semiconductor
- g-line lithography
- i-line lithography
- KrF eximer lithography
- ArF eximer lithography
- Multi-layer resist
- Passivation resist
- Cross linker for electronic materials
- Photoresist for FPD
- LCD panel area
- TFT panel area
- OLED area
- Permanent top coat
- Color filter
- Black matrix
- Passivation
- Cross linker for electronic materials
Inquiries regarding products and solutions
Strategy-planning & Task Force Office
797-6 Shukuorui-machi, Takasaki-shi,
Gunma 370-0032, Japan
TEL +81-27-353-1800
Related information/Related products
- PSF-2803
- PSF-2807
- PSF-2808
Inquiries
Inquiries regarding company information accepted via phone and e-mail.
Strategy-planning & Task Force Office
797-6 Shukuorui-machi, Takasaki-shi,
Gunma 370-0032, Japan
TEL +81-27-353-1800
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